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Research Area	Energy Control of Processing Energy Transfer Dynamics Manufacturing Process ECO Materials Processing Welding Mechanism Laser Materials Processing Composite Materials Processing Joining Mechanics and Analyses Joining Design and Dependability Joint Interface Structure and Formation Mechanism Structural Integrity and Failure Assessments Smart Beam Processing Smart Coating Processing Nano/Micro Structure Control Life-Innovation Materials Processing Reliability Evalution&Simulation Smart Green Processing Advanced Processing for Hybrid Materials Toyo Tanso(Advanced Carbon Design)Joint Research Chair Joining Technology for New Metallic Glasses and Inorganic Materials Global Collaborative Research Center for Computational Welding Science Development of Interdisciplinary and International Researchers for Creation of Life-Innovation Materials Fuji Electric Power Device Smart Joining Joint Research Chair All Area
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Title	Research achievements summary	Name
The effect of the H2/(H2+Ar) flow-rate ratio on hydrogenated amorphous carbon films grown using Ar/H2/C7H8 plasma chemical vapor deposition	Thin Solid Films,660,8(2018),891-898	T. Fang K. Yamaki K. Koga D. Yamashita H. Seo N. Itagaki M. Shiratani K. Takenaka Y. Setsuhara
Plasma-enhanced reactive linear sputtering source for formation of silicon-based thin films	Review of Scientific Instruments,89,8(2018),083902/1-083902/6	K. Takenaka Y. Setsuhara J. G. Han G. Uchida A. Ebe
Effect of a plasma-activated medium produced by direct irradiation on cancer cell killing	Japanese Journal of Applied Physics,57,9(2018),096201-1-096201-6	G. Uchida T. Ito J. Ikeda T. Suzkuki K. Takenaka Y. Setsuhara
Fabrication of high-performance InGaZnOx thin film transistors based on control of oxidation using a low-temperature plasma	Applied Physics Letters,112,15(2018),152103/1-152103/3	K. Takenaka M. Endo G. Uchida Y. Setsuhara
Low-temperature formation of c-axis orientated aluminum nitride thin films with plasma-assisted reactive pulsed-DC magnetron sputtering	Japanese Journal of Applied Physics,57,(2017),01AD06-1-01AD06-5	Kosuke Takenaka Yoshikatsu Satake Giichiro Uchida Yuichi Setsuhara
Selective production of reactive oxygen and nitrogen species in the plasma treated water by using a nonthermal high-frequency plasma jet	Japanese Journal of Applied Physics,57,1(2017),0102B4-1-0102B4-6	G. Uchida K. Takenaka K. Takeda K. Ishikawa M. Hori Y. Setsuhara

Title	Research achievements summary	Name
低ダメージ大面積プロセス対応プラズマ生成・制御技術の開発	2018年度フロンティア材料研究所学術賞受賞記念講演会・若手教員講演会,東京,(2018.09.04)	節原　裕一
大気圧プラズマプロセスの最前線-異材接合から医療応用まで-	第22回電子デバイス実装研究委員会,東京,(2018.07.02)	内田　儀一郎 竹中　弘祐 節原　裕一
Plasma-Enhanced Reactive Processes for Low-Temperature Formation of　High-Mobility IGZO Thin Film Transistor and Functional Films for Solar Cells	5th Japan-Korea Joint Symposium on Advanced Solar Cells 2018 and 2nd International Symposium on Energy Research and Application,Suwon,Korea,(2018.02.05-2018.02.06)	Yuichi Setsuhara Masashi Endo Kosuke Takenaka Giichiro Uchida Akinori Ebe

Title	Research achievements summary	Name
Plasma Medical Science	Elsevier,(2018),,17-25	Yuichi Setsuhara Giichiro Uchida Kosuke Tekenaka

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