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[エネルギー変換機構学分野]分野指定

雑誌掲載論文

表 題 研究業績概要 氏 名
High rate formation of silicon nitride thin films using plasma-assisted reactive sputtering deposition   Thin Solid Films,685,(2019),306-311 Kosuke Takenaka
Yuichi Setsuhara
Jeon Geon Han
Giichiro Uchida
Akinori Ebe
Droplet-Vaporization Behavior during Plasma-Assisted Mist Chemical Vapor Deposition of Zinc Oxide Films   Plasma Sources Science & Technology,28,(2019),065015/1-065015/8 Kosuke Takenaka
Yuichi Setsuhara
Low-temperature formation of high-mobility a-InGaZnOx films using plasma-enhanced reactive processes   Japanese Journal of Applied Physics,58,(2019),090605/1-090605/5 Kosuke Takenaka
Masashi Endo
Hiroyuki Hirayama
Giichiro Uchida
Akinori Ebe
Yuichi Setsuhara
Decomposition and oxidation of methionine and tryptophan following irradiation with a nonequilibrium plasma jet and applications forkilling cancer cells   Scientific Reports,9,(2019),6625/1-6625/17 Giichiro Uchida
Yusuke Mino
Tensho Suzuki
Jun-ichiro Ikeda
Takashi Suzuki
Kosuke Takenaka
Yuichi Setsuhara
Effects of post-deposition plasma treatments on stability of amorphous InGaZnOx thin-film transistors prepared with plasma-assisted reactive magnetron sputtering   Japanese Journal of Applied Physics,58,2s(2019), SAAC03/1- SAAC03/5 K. Takenaka
M. Endo
G. Uchida
Y. Setsuhara
Influence of sputtered atom flux on the electrical properties of a-IGZO films deposited by plasma-enhanced reactive sputtering   Journal of Alloys and Compounds,772,(2019),642-649 K. Takenaka
M. Endo
G. Uchida
Y. Setsuhara
A. Ebe

国際会議発表,国内学会発表

表 題 研究業績概要 氏 名
プラズマ支援ミストCVDにおけるプラズマ中の液滴蒸発挙動(II) 第80回応用物理学会秋季学術講演会,北海道大学,(2019.09.18-2019.09.21), 竹中 弘祐
節原 裕一
反応性プラズマプロセスを用いた高移動度IGZO薄膜トランジスタの低温形成 第80回応用物理学会秋季学術講演会,北海道大学,(2019.09.18-2019.09.21), 節原 裕一
竹中 弘祐
平山 裕之
遠藤 雅
内田 儀一郎
江部 明憲
Applications of plasma-treated amino acid water for killing cancer cells 12th Asian-European International Conference on Plasma Surface Engineering (AEPSE2019),Jeju, Korea,(2019.09.01-2019.09.05), Giichiro Uchida
Jun-ichiro Ikeda
Kosuke Takenaka
Yuichi Setsuhara
Plasma-Enhanced Reactivity-Control Processes for Low-Temperature Formation of High-Mobility IGZO Thin-Film Transistors 12th Asian-European International Conference on Plasma Surface Engineering (AEPSE2019),Jeju, Korea,(2019.09.01-2019.09.05), Yuichi Setsuhara
Kosuke Takenaka
Hiroyuki Hirayama
Giichiro Uchida
Akinori Ebe
Droplet-vaporization behavior in vacuum during plasma-assisted mist chemical vapor deposition XXIV International Conference on Phenomena in Ionized Gases (XXXIV ICPIG) and 10th International Conference on Reactive Plasmas (ICRP-10),Sapporo, Hokkaido, Japan,(2019.07.14-2019.07.19), Kosuke Takenaka
Yuichi Setsuhara
Effects of liquid properties on plasma-induced liquid flow XXIV International Conference on Phenomena in Ionized Gases (XXXIV ICPIG) and 10th International Conference on Reactive Plasmas (ICRP-10),Sapporo, Hokkaido, Japan,(2019.07.14-2019.07.19), Keisuke Nishida
Makoto Kawaguchi
Yuka Hazama
Giichiro Uchida
Fumiaki Mitsugi
Nozomi Takeuchi
Kosuke Takenaka
Kazunari Koga
Yuichi Setsuhara
Masaharu Shiratani
Toshiyuki Kawasaki
Effects of surrounding gas on plasma-induced liquid flow XXIV International Conference on Phenomena in Ionized Gases (XXXIV ICPIG) and 10th International Conference on Reactive Plasmas (ICRP-10),Sapporo, Hokkaido, Japan,(2019.07.14-2019.07.19), Toshiyuki Kawasaki
Keisuke Nishida
Makoto Kawaguchi
Yuka Hazama
Giichiro Uchida
Fumiaki Mitsugi
Nozomi Takeuchi
Kosuke Takenaka
Kazunori Koga
Yuichi Setsuhara
Masaharu Shiratani
Plasma-assisted reactive processes for low-temperature fabrication of high-mobility InGaZnOx TFTs XXIV International Conference on Phenomena in Ionized Gases (XXXIV ICPIG) and 10th International Conference on Reactive Plasmas (ICRP-10),Sapporo, Hokkaido, Japan,(2019.07.14-2019.07.19), Yuichi Setsuhara
Masashi Endo
Horoyuki Hirayama
Tomoki Yoshitani
Kosuke Takenaka
Giichiro Uchida
Akinori Ebe
Gate-bias instability of amorphous In-Ga-Zn-Ox thin-film transistors fabricated by plasma-assisted reactive processes 11th International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials (ISPlasma 2019) / 12th International Conference on Plasma Nano Technology & Science(IC-PLANTS 2019),Nagoya Institute of Technology, Nagoya, Japan,(2019.03.17-2019.03.21), Kosuke Takenaka
Masashi Endo
Tomoki Yoshitani
Hiroyuki Hirayama
Giichiro Uchida
Akinori Ebe
Yuichi Setsuhara
プラズマ支援ミストCVDにおけるプラズマ中の液滴蒸発挙動 第66回応用物理学会春季学術講演会,東京工業大学 大岡山キャンパス,(2019.03.09-2019.03.12), 竹中 弘祐
節原 裕一
プラズマ支援反応性プロセスを用いた大面積基板へのIGZO薄膜トランジスタの形成 第66回応用物理学会春季学術講演会,東京工業大学 大岡山キャンパス,(2019.03.09-2019.03.12), 節原 裕一
竹中 弘祐
吉谷 友希
平山 裕之
遠藤 雅
内田 儀一郎
江部 明憲
Gate-bias instability of Amorphous InGaZnOx Thin-film Transistors Prepared with Plasma-assisted Reactive Processes 第36回 プラズマプロセシング研究会/第31回 プラズマ材料科学シンポジウム,高知城ホール,(2019.01.15-2019.01.17), Kosuke Takenaka
Masashi Endo
Tomoki Yoshitani
Hiroyuki Hirayama
Giichiro Uchida
Akinori Ebe
Yuichi Setsuhara
Positive-current-bias Instability of Post-deposition Plasma-treated IGZO TFTs Prepared with Plasma-assisted Reactive Sputtering 第28回日本MRS年次大会,西日本総合展示場 他,(2018.12.18-2018.12.20), Kosuke Takenaka
Masashi Endo
Tomoki Yoshitani
Hiroyuki Hirayama
Giichiro Uchida
Yuichi Setsuhara
プラズマ接触照射で作製したプラズマ活性培養液のがん細胞殺傷効果 第35回プラズマ核融合学会年会,大阪大学吹田キャンパス,(2018.12.03-2018.12.06), 内田 儀一郎
池田 純一郎
鈴木 天翔
竹中 弘祐
節原 裕一
Gate-bias instability of post-deposition plasma treated amorphous InGaZnOx thin-film transistors prepared with plasma-assisted reactive magnetron sputtering 40th International Symposium on Dry Process (DPS2018),Nagoya University, Nagoya,(2018.11.13-2018.11.15), Kosuke Takenaka
Yuichi Setsuhara
Masashi Endo
Giichiro Uchida
Development of Low-Temperature Plasma Process for Nitride and Oxide Functional Films Formation The 15th International Conference on Flow Dynamics (ICFD2018),Sendai, Miyagi, Japan,(2018.11.07-2018.11.09), Kosuke Takenaka
Giichiro Uchida
Yuichi Setauhara and
Takeru Okada

講演

表 題 研究業績概要 氏 名
Studies on selective production of RONS and chemical change of amino acids in plasma-treated solutions XXIV International Conference on Phenomena in Ionized Gases (XXXIV ICPIG) and 10th International Conference on Reactive Plasmas (ICRP-10),Sapporo, Japan,(2019.07.14-2019.07.19) Giichiro Uchida
Kosuke Takenaka
Jun-ichiro Ikeda
Yuichi Setsuhara
Reactive plasma processes for formation of high-mobility IGZO thin-film transistors 21st International Conference on Advanced Energy Materials and Research,Zurich, Switzerland,(2019.07.11-2019.07.12) Yuichi Setsuhara
Low-temperature formation of high-mobility InGaZnOx thin film transistor by ICP-enhanced reactive plasma processes Yuichi Setsuhara The 15th International Symposium on Sputtering and Plasma Processes (ISSP2019) ,Kanazawa, Japan,(2019.06.11-2019.06.14) Yuichi Setsuhara
Kosuke Takenaka
Masashi Endo
Tomoki Yoshitani
Giichiro Uchida
Akinori Ebe
ICP-Enhanced Reactive Plasma Processes for Low-Temperature Formation of High-Mobility Oxide Semiconductor TFT The 5th Asian Workshop on Applied Plasma Science and Engineering 2019 (APSE2019),University of Malaya, Kuala Lumpur, Malaysia,(2019.01.28-2019.01.29) Yuichi Setsuhara
Masashi Endo
Tomoki Yoshitani
Kosuke Takenaka
Giichiro Uchida
Akinori Ebe
Control of RONS in plasma-activated solutions and their application to cancer cell killing 28th Annual meeting of MRS-Japan 2018,Kita-kyushu,Japan,(2018.12.18-2018.12.20) G. Uchida
T. Suzuki
J. Ikeda
K. Takenaka
Y.Setsuhara
Formation of Functional Thin Films at Low Temperature using Plasma-assisted Reactive Processes 第28回日本MRS年次大会,西日本総合展示場 他,(2018.12.18-2018.12.20) Kosuke Takenaka
Masashi Endo
Tomoki Yoshitani
Hiroyuki Hirayama
Giichiro Uchida
Akinori Ebe
Yuichi Setsuhara
Control of ROS and RNS productions in liquid by using a nonthermal high-frequency plasma jet 2nd Asia-Pacific Conference on Plasma Physics,Kanazawa,Japan,(2018.11.12-2018.11.16) Giichiro Uchida
Kosuke Takenaka
Yuichi Setsuhara
Studies of selective production of RONS in the plasma treated water and interaction between the plasma and amino acids The 71st Annual Gaseous Electronics Conference,Portland,USA,(2018.11.05-2018.11.09) Giichiro Uchida
プラズマアシスト反応性プロセスを用いた低温での高移動度薄膜トランジスタの作製 第2回酸化物半導体討論会/学際・国際的高度人材育成ライフイノベーションマテリアル創製共同研究プロジェクト分科会/第76回フロンティア材料研究所講演会,神奈川,(2018.10.26) 竹中 弘祐
節原 裕一
内田 儀一郎
井手 啓介
神谷 利夫

解説

表 題 研究業績概要 氏 名
大気非平衡プラズマによる水中活性種の生成・制御 金属,89,6(2019),9-14 節原 裕一
内田 儀一郎
竹中 弘祐
大気圧非平衡He プラズマジェットと溶液との相互作用に関する可視化研究 スマートプロセス学会誌,8,2(2019),58-63 内田 儀一郎
竹中 弘祐
川崎 敏之
古閑 一憲
白谷 正治
節原 裕一

著書

表 題 研究業績概要 氏 名
Novel Structured Metallic and Inorganic Materials Springer,(2019),共同編集,分担執筆, Yuichi Setsuhara
Toshio Kamiya
Shin-ichi Yamaura
 
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