Session E: Microstructure
Date:   Friday, September 26, 2003
Time:   9:15 a.m. - 12:30 p.m.
Venue: Kurashiki City Art Museum 3F Hall
        Session Chair (E1-5):
R.Waesche, Federal Institute for Materials Research and Testing (BAM), Germany
9:15 - 9:45 E-1 Microstructural Characterization of Interfaces in Advanced Materials to the Atomic Level  (Invited)
Manfred Rühle
        Max-Planck-Institut für Metallforschung, Heisenbergstr. 3, 70569 Stuttgart, Germany
9:45 - 10:00 E-2 Microstructural Characterization and Mechanical Properties of AlN Ceramics with Y2O3
Seiji Iwasawa, Junichi Tatami, Katsutoshi Komeya and Takeshi Meguro
        Yokohama National University, Japan
10:00 - 10:15 E-3 Microstructure of AlN Fibers Synthesized from Al2O3-NH3-C3H8
Yusuke Matsumoto, Junichi Tatami, Takeshi Meguro, Katsutoshi Komeya, Toyohiko Yano*
        Yokohama National University, Japan
*Tokyo Institute of Technology, Japan
10:15 - 10:30 E-4 Sintering Behavior of AlN
Junichi Tatami, Katsutoshi Komeya and Takeshi Meguro
        Yokohama National University, Japan
10:30 - 11:00 E-5 Characterization of Internal Interfaces in Translucent Polycrystalline Alumina  (Invited)
G. C. Wei
        OSRAM SYLVANIA, 71 Cherry Hill Drive, Beverly, MA 01915, USA
        Session Chair (E6-9) : K.Komeya, Yokoyama National University, Japan
11:00 - 11:30 E-6 Crack Healing in Silicon Carbide  (Invited)
Min-Cheol Chu,
Seong-Jai Cho
        Crack Healing in Silicon Carbide  (Invited)
Min-Cheol Chu, Seong-Jai Cho
11:30 - 11:45 E-7 Interface Bonding of Si3N4 Ceramic To Nickel Base Superalloy by Active Fillers
S.P.Lu, Y.Guo
        Institute of Metal Research, Chinese Academy of Sciences, Dhenyang,Liaoning, P.R.China,110016
11:45 - 12:00 E-8 Nanoscale Heat Conduction Across Multi-Layer Thin Films and their Boundaries
Tetsuya Baba and Naoyuki Taketoshi
        National Metrology Institute of Japan, AIST, Japan
12:00 - 12:30 E-9 Growth, Structure, and Properties of Epitaxial Nitride Layers, Superlattices, and Nanolaminates by UHV Reactive Magnetron Sputtering  (Invited)
Lars Hultman 
        Thin Film Physics Division, IFM, Linkoping University, Sweeden