| Session E: | Microstructure | |||
| Date: | Friday, September 26, 2003 | |||
| Time: | 9:15 a.m. - 12:30 p.m. | |||
| Venue: | Kurashiki City Art Museum 3F Hall | |||
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Session Chair (E1-5): R.Waesche, Federal Institute for Materials Research and Testing (BAM), Germany |
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| 9:15 | - | 9:45 | E-1 |
Microstructural Characterization of Interfaces in Advanced Materials to
the Atomic Level (Invited) Manfred Rühle |
| Max-Planck-Institut für Metallforschung, Heisenbergstr. 3, 70569 Stuttgart, Germany | ||||
| 9:45 | - | 10:00 | E-2 |
Microstructural Characterization and Mechanical Properties of AlN
Ceramics with Y2O3 Seiji Iwasawa, Junichi Tatami, Katsutoshi Komeya and Takeshi Meguro |
| Yokohama National University, Japan | ||||
| 10:00 | - | 10:15 | E-3 |
Microstructure of AlN Fibers Synthesized from Al2O3-NH3-C3H8 Yusuke Matsumoto, Junichi Tatami, Takeshi Meguro, Katsutoshi Komeya, Toyohiko Yano* |
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Yokohama National University, Japan *Tokyo Institute of Technology, Japan |
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| 10:15 | - | 10:30 | E-4 |
Sintering Behavior of AlN Junichi Tatami, Katsutoshi Komeya and Takeshi Meguro |
| Yokohama National University, Japan | ||||
| 10:30 | - | 11:00 | E-5 |
Characterization of Internal Interfaces in Translucent Polycrystalline
Alumina (Invited) G. C. Wei |
| OSRAM SYLVANIA, 71 Cherry Hill Drive, Beverly, MA 01915, USA | ||||
| Session Chair (E6-9) : K.Komeya, Yokoyama National University, Japan | ||||
| 11:00 | - | 11:30 | E-6 |
Crack Healing in Silicon Carbide (Invited) Min-Cheol Chu, Seong-Jai Cho |
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Crack Healing in Silicon Carbide (Invited) Min-Cheol Chu, Seong-Jai Cho |
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| 11:30 | - | 11:45 | E-7 |
Interface Bonding of Si3N4 Ceramic To Nickel Base Superalloy by Active
Fillers S.P.Lu, Y.Guo |
| Institute of Metal Research, Chinese Academy of Sciences, Dhenyang,Liaoning, P.R.China,110016 | ||||
| 11:45 | - | 12:00 | E-8 |
Nanoscale Heat Conduction Across Multi-Layer Thin Films and their
Boundaries Tetsuya Baba and Naoyuki Taketoshi |
| National Metrology Institute of Japan, AIST, Japan | ||||
| 12:00 | - | 12:30 | E-9 |
Growth, Structure, and Properties of Epitaxial Nitride Layers,
Superlattices, and Nanolaminates by UHV Reactive Magnetron Sputtering
(Invited) Lars Hultman |
| Thin Film Physics Division, IFM, Linkoping University, Sweeden | ||||