| Session H: | Nanotechnology | |||
| Date: | Saturday, September 27, 2003 | |||
| Time: | 9:15 a.m. - 12:30 p.m. | |||
| Venue: | Kurashiki City Art Museum 3F Conference Room 2 | |||
| Session Chair (H1-5): T.Baba, National Metrology Institute of Japan, AIST, Japan | ||||
| 9:15 | - | 9:45 | H-1 |
Nanotechnology - from Promising to Practical The Role of Standards
(Invited) Stephen Freiman |
| Deputy Director, Materials Science and Engineering Laboratory, NIST, Gaithersburg, MD, US | ||||
| 9:45 | - | 10:00 | H-2 |
Development of a Method for Mass Distribution Measurement of Particles in
the Aerosol Phase Kensei EHARA and Keiji TAKAHATA |
| National Institute of Advanced Industrial Science and Technology, Japan | ||||
| 10:00 | - | 10:15 | H-3 |
Nonequillibrium Formation of Nanoscale Ultra-Shallow Junctions by
Coherent Phonon Excitation Process Y.Setsuhara*, M.Hashida**, M.Fuita**, B.Mizuno***, K.Takahashi*, K.Nogi**** and K.Ono* |
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*Graduate School of Engineering, Kyoto University, Kyoto, Japan **Institute for Laser Technology, Osaka, Japan ***Ultimate Junction Technologies Inc., Osaka, Japan ****Joining and Welding Research Institute, Osaka University, Osaka, Japan |
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| 10:15 | - | 10:30 | H-4 |
Recent Developments in Nanotechnology in Thailand (Invited) Pairash Thajchayapong and Wiwut Tanthapanichakoon |
| Chulalongkorn University, Thai Powder Technology Center, Thailand | ||||
| 10:30 | - | 10:45 | H-5 |
The Applications of Nano Materials and Their Future C. C. Huang |
| Hosokawa Nano Particle Technology Center, USA | ||||
| Session Chair (H6-9) : S.Freiman, NIST, USA | ||||
| 10:45 | - | 11:15 | H-6 |
Growth and Characterization of Heteroepitaxial SiC and ZnO Films on Si
Substrates Using Various Interface Patterning and Buffer Layers (Invited) Byung-Teak Lee, Ju-Hoon Park, Il-Soo Kim, and Sung-Yeon Hwang |
| Photonic and Electronic Thin Film Lab., Chonnam National University,Gwangju, 500-757, Republic of Korea | ||||
| 11:15 | - | 11:30 | H-7 |
Nano-Sized Crystals Grown in Phase Separated Microenvironments Kimiyasu Sato, Yuji Hotta, Yoshiaki Kinemuchi and Koji Watari |
| National Institute of Advanced Industrial Science and Technology (AIST), Japan | ||||
| 11:30 | - | 11:45 | H-8 |
Ferroelectric Domain Interface in Defect-engineered Oxides with Bismuth
Layered Structure Yuji NOGUCHI *,**, Masatake TAKAHASHI *and Masaru MIYAYAMA * |
| * IIS, University of Tokyo, Japan, ** PRESTO, JST, Japan | ||||
| 11:45 | - | 12:15 | H-9 |
Nanostructure Design and Manipulation by Electron Beam Energy (Invited) Shun-ichiro TANAKA |
| Department of Engineering Physics, Electronics and Mechanics, Nagoya Institute of Technology, Japan | ||||